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Sequential Magnetron Sputtering Coating Production Line

Sequential magnetron sputtering coating production line is mainly applied in sheet glass, acrylic, high-quality, excellent-performance mental films (PC, PE), electromagnetic screen film, reflection film, composite film, NESA, Anti-reflective film, etc.

Description

Sequential magnetron sputtering coating production line uses the streamlined planar magnetron cathode and C-MAG cylindrical sputtering cathode.

Application

Sequential magnetron sputtering coating production line is mainly applied in sheet glass, acrylic, high-quality, excellent-performance mental films (PC, PE), electromagnetic screen film, reflection film, composite film, NESA, Anti-reflective film, etc.

Advantages

1. Coating chamber adopts unitary structure, which can adjust cathode and pump package in terms of different process requirements.
2. Sequential magnetron sputtering coating production line uses the streamlined planar magnetron cathode and C-MAG cylindrical sputtering cathode.
3. The cathode structure of baffle saves the cycle of target material replacing and process cleaning.
4. High quality domestic component is not only reduce manufacture cost, use cost, but reduce time and cost of failure recovery.

Features

1. Type: Horizontal-type and Vertical- type
2. Production Cycle: 60s
3. Capacity: Annual output > 2000,000 m2
4. Maximum Specification of Glass: 9000 mm × 2540 mm;
5. Film Uniformity: ≤±5% (effective deposition zone)
6. Cathode Structure: Mid frequency twin rotation cathode, panel cathode, etc.
7. Transmission Model: Wheel design
8. Implementation model: Heat reflecting mirror coating machine, temperable heat reflecting mirror products, single silver low-radiation film production
9. Control System: Man-machine conversation is available and we will intervene in the process of operation, in which alarm prompt and fault display can help operators to prompt the correct operation and troubleshooting.

Parameters

1. Ultimate Vacuum Pressure: 6×10E-4Pa
2. Average production cycle: in terms of products
3. Substrate support Size: in terms of requirements
4. Film uniformity: ±3%