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Products > Vacuum Coater > Power Supply(for Vacuum Coating)

Power Supply(for Vacuum Coating)

There are various types of power supplies used in vacuum coating, including MF power supply, DC, cathodic arc source, bias voltage power supply and pulsed power supply. Below is a brief description outlining the differences between these power types.
There are various types of power supplies used in vacuum coating, including MF power supply, DC, cathodic arc source, bias voltage power supply and pulsed power supply. Below is a brief description outlining the differences between these power types.

Mid-Frequency Sputtering Power

To ensure a high sputtering rate and uniform deposition across a wide area of substrate, this mid-frequency power supply is the power of choice to enable a high deposition rate. If most of your vacuum coating work involves architectural glass or large-scale metal parts, the MF power supply is the ideal way to go.

DC Sputtering Power

Our DC power supply is the power source of choice for cathodic arc deposition process that uses one or two cathodes. If the substrate is conductive, a DC power can be applied to the substrate as well.

Cathodic Arc Power Source

The cathodic arc power source is specially designed for use in arc vaporization, supplying the power needed to vaporize the cathode into a plasma state which is then deposited on the part substrate. The free ions reach the substrate surface at a high energy level, able to form a strong mechanical bond to the substrate.

Bias Voltage Power Supply

Bias voltage power supply has received the widest use in recent years. It applies a bias voltage to the substrate, aiding the sputter cleaning, dry etching and film deposition process. The bias voltage power supply can be applied to various target materials in vacuum coating as well.

Pulsed Power Supply

By supplying pulses of voltage to the target, the pulsed power supply can increase the ionization of the target material thereby ensuring an excellent deposit.